Air Pollution Control and Emissions Standards for the Semiconductor Industry｜第 5 條｜大氣環境｜Regulation｜In Force
環境部｜v1.0
Last Amended: 2023-05-04
For exhaust gases collected in accordance with the preceding article, flowmeters and concentration monitors shall be installed at the exhaust gas inlet of the pollution prevention and control equipment or at the discharge outlet of the discharge pipe. The installation shall meet the following requirements: 1. Flowmeters shall be installed for the Semiconductor manufacturing industry governed by these Standards. 2. In the event that the annual consumption of volatile organic compounds (VOC) is more than 25 tons or the total plant discharge volume is more than 0.6 kg per hour, it shall be deemed as a pipeline with VOCs discharge greater than 14 ppm under an existing established process or with VOCs discharge greater than 10 ppm under a newly established process, a VOCs concentration monitor shallbe installed to prove its compliance with the discharge reduction rate hereunder. Where an existing process and a newly established process are combined to set up a discharge pipeline, the newly established process shall prevail. 3. The effective quarterly monitoring rate of the flow meters and concentration monitors shall exceed 80%. Comparative testing shall be performed using standard testing methods at least once each year; the comparative testing shall last for at least two hours on each occasion, and results obtained from the flowmeters and concentration monitors shall be corrected on the basis of the most recent comparative testing results. When the flow meters and concentration monitors have not been installed as prescribed in the foregoing paragraph, the public or private premises may submit an alternative solution that can prove that the discharge of the pollutants complies with the discharge standard set forth in the preceding article to the competent authority of the municipality or county (city) for approval. Upon this approval, the restriction will not apply.